| 7337098 |
Diffraction condition simulation device, diffraction measurement system, and crystal analysis system |
Ryouichi Yokoyama, Kamihisa Endo, Tetsuya Ozawa |
2008-02-26 |
| 7280634 |
Beam conditioning system with sequential optic |
Boris Verman |
2007-10-09 |
| 7076026 |
Beam conditioning system |
Boris Verman |
2006-07-11 |
| 6970532 |
Method and apparatus for measuring thin film, and thin film deposition system |
Seiichi Hayashi, Tetsuo Kikuchi, Kazuhiko Omote, Katsuhiko Inaba |
2005-11-29 |
| 6823042 |
Apparatus for X-ray analysis and apparatus for supplying X-rays |
Seiichi Hayashi, Sadayuki Takahashi, Masaru Kuribayashi |
2004-11-23 |
| 6813338 |
Method for measuring powder x-ray diffraction data using one-or-two-dimensional detector |
Masaki Takata, Eiji Nishibori, Makoto Sakata |
2004-11-02 |
| 6385281 |
Fluorescent x-ray analyzing method and apprartus |
Tetsuya Ozawa, Kazuhiko Omote |
2002-05-07 |
| 6249566 |
Apparatus for x-ray analysis |
Seiichi Hayashi, Kazuhiko Omote |
2001-06-19 |
| 6198796 |
Method and apparatus of automatically selecting bragg reflections, method and system of automatically determining crystallographic orientation |
Ryoichi Yokoyama |
2001-03-06 |