Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11339308 | Chemical mechanical polishing method | Wei-Wen Tsai, Lin-Chen Ho, Cheng-Ping Lee | 2022-05-24 |
| 10573524 | Method of chemical mechanical polishing a semiconductor substrate | Wei-Wen Tsai, Cheng-Ping Lee | 2020-02-25 |
| 10557060 | Method of chemical mechanical polishing a substrate | Lin-Chen Ho, Wei-Wen Tsai, Cheng-Ping Lee | 2020-02-11 |
| 9299585 | Method for chemical mechanical polishing substrates containing ruthenium and copper | Hongyu Wang, Lee Melbourne Cook, Ching-Hsun Chao | 2016-03-29 |
| 6749484 | Chemical mechanical polishing (CMP) apparatus with temperature control | Ming-Cheng Yang | 2004-06-15 |
| 6632742 | Method for avoiding defects produced in the CMP process | Ming-Cheng Yang | 2003-10-14 |
| 6478659 | Chemical mechanical polishing method for slurry free fixed abrasive pads | Cheng-An Peng | 2002-11-12 |
| 6432728 | Method for integration optimization by chemical mechanical planarization end-pointing technique | Shuo Yen Tai, Ming-Cheng Yang, Champion Yi | 2002-08-13 |
| 6306022 | Chemical-mechanical polishing device | Joseph Tung, Ming-Cheng Yang, Lung-Hu Lin | 2001-10-23 |
| 6227949 | Two-slurry CMP polishing with different particle size abrasives | Champion Yi, Rurng-Chien Chang | 2001-05-08 |
| 6218305 | Composition and method for polishing a composite of silica and silicon nitride | Sharath Hosali, Anantha R. Sethuraman, Lee Melbourne Cook, Michael R. Oliver | 2001-04-17 |
| 6132637 | Composition and method for polishing a composite of silica and silicon nitride | Sharath Hosali, Anantha R. Sethuraman, Lee Melbourne Cook, Michael R. Oliver | 2000-10-17 |
| 6130163 | Stabilization of slurry used in chemical mechanical polishing of semiconductor wafers by adjustment of PH of deionized water | Champion Yi, Ching-Feng Tsai | 2000-10-10 |
| 6053802 | Stabilization of slurry used in chemical mechanical polishing of semiconductor wafers by megasonic pulse | Champion Yi, Jen-Chieh Tung | 2000-04-25 |
| 6042741 | Composition for polishing a composite of silica and silicon nitride | Sharath Hosali, Anantha R. Sethuraman, Lee Melbourne Cook | 2000-03-28 |
| 5769689 | Compositions and methods for polishing silica, silicates, and silicon nitride | David Cossaboon, Lee Melbourne Cook | 1998-06-23 |
| 5756398 | Composition and method for polishing a composite comprising titanium | Anantha R. Sethuraman, Lee Melbourne Cook | 1998-05-26 |
| 5738800 | Composition and method for polishing a composite of silica and silicon nitride | Sharath Hosali, Anantha R. Sethuraman, Lee Melbourne Cook | 1998-04-14 |
| 5693239 | Polishing slurries comprising two abrasive components and methods for their use | Anantha R. Sethuraman, Huey-Ming Wang, Lee Melbourne Cook | 1997-12-02 |
| 5389352 | Oxide particles and method for producing them | — | 1995-02-14 |