Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6817924 | Chemical mechanical polishing apparatus, profile control system and conditioning method thereof | Ching-Yen Lin, Chia-Ching Hsieh, Kao-Wei Huang | 2004-11-16 |
| 6679765 | Slurry supply system disposed above the rotating platen of a chemical mechanical polishing apparatus | Yu-Wei Chin, Kuan-Fu Chang, Sheng Chang | 2004-01-20 |
| 6053802 | Stabilization of slurry used in chemical mechanical polishing of semiconductor wafers by megasonic pulse | Champion Yi, Jiun-Fang Wang | 2000-04-25 |