Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for selectively etching tungsten in a downstream reactor

Systems and methods for selectively etching tungsten in a downstream reactor

US Patent 9837286 · Granted Dec 5, 2017

Estimated economic value: $38,425,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Power supply apparatus for self-powered device and operation method thereof2025
Semiconductor device and semiconductor system2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Memory devices including different tier pitches, and related electronic systems2024
Biosignal processing apparatus based on intelligent control2024
Memory arrays comprising strings of memory cells and methods used in forming a m2024
Integrated assemblies, and methods of forming integrated assemblies2024
Power management apparatus based on user pattern and method2024
Electronic devices comprising reduced charge confinement regions in storage node2024
Accumulator, operational logic circuit including accumulator, and processing-in-2024