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Home › Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching

US Patent 9754769 · Granted Sep 5, 2017

Estimated economic value: $29,769,000 ⓘ

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