Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process gas enhancement for beam treatment of a substrate

Process gas enhancement for beam treatment of a substrate

US Patent 9735019 · Granted Aug 15, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate scanning apparatus with pendulum and rotatable substrate holder2025
Wafer scanning apparatus and method for focused beam processing2024
Tuning gas cluster ion beam systems2023
Pattern enhancement using a gas cluster ion beam2023
Wafer scanning apparatus and method for focused beam processing2023
Pattern enhancement using a gas cluster ion beam2022
Hybrid corrective processing system and method2021
Compensated location specific processing apparatus and method2020
Compensated location specific processing apparatus and method2020
Compensated location specific processing apparatus and method2020
Methods for additive formation of a STT MRAM stack2020
Compensated location specific processing apparatus and method2019