Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Wafer scanning apparatus and method for focused beam processing

Wafer scanning apparatus and method for focused beam processing

US Patent 11915906 · Granted Feb 27, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate scanning apparatus with pendulum and rotatable substrate holder2025
Tuning gas cluster ion beam systems2023
Pattern enhancement using a gas cluster ion beam2023
Wafer scanning apparatus and method for focused beam processing2023
Wafer scanning apparatus and method for focused beam processing2023
Wafer scanning apparatus and method for focused beam processing2023
Pattern enhancement using a gas cluster ion beam2022
Compensated location specific processing apparatus and method2020
Compensated location specific processing apparatus and method2019
Process gas enhancement for beam treatment of a substrate2017
GCIB nozzle assembly2016
Molecular beam enhanced GCIB treatment2016