Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for extreme ultraviolet mask defect mitigation by multi-patterning

Methods for extreme ultraviolet mask defect mitigation by multi-patterning

US Patent 9673111 · Granted Jun 6, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pellicles and devices comprising a photomask and the pellicle2016
System and methods for OPC model accuracy management and disposition2016
Methods for extreme ultraviolet mask defect mitigation by multi-patterning2016
Methods for extreme ultraviolet mask defect mitigation by multi-patterning2016
Method and apparatus for performing optical proximity and photomask correction2015
System and methods for OPC model accuracy management and disposition2015
Etch failure prediction based on wafer resist top loss2014
Methods for enhancing photolithography patterning2013
Mask system employing substantially circular optical proximity correction target2013
Angled-wedge chrome-face wall for intensity balance of alternating phase shift m2011
Cross technology reticles2011
Monitoring structure2011