Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and methods for OPC model accuracy management and disposition

System and methods for OPC model accuracy management and disposition

US Patent 9053269 · Granted Jun 9, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Training of large neural networks2025
Methods for extreme ultraviolet mask defect mitigation by multi-patterning2017
Pellicles and devices comprising a photomask and the pellicle2016
System and methods for OPC model accuracy management and disposition2016
System and methods for OPC model accuracy management and disposition2016
System and methods for OPC model accuracy management and disposition2016
System and methods for OPC model accuracy management and disposition2016
Methods for extreme ultraviolet mask defect mitigation by multi-patterning2016
Method and apparatus for performing optical proximity and photomask correction2015
Etch failure prediction based on wafer resist top loss2014
Etch failure prediction based on wafer resist top loss2014
Methods for enhancing photolithography patterning2013