Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithography system and method for mask inspection

Lithography system and method for mask inspection

US Patent 9618855 · Granted Apr 11, 2017

Estimated economic value: $2,677,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and systems for aligning master oscillator power amplifier systems2025
Droplet generator and method of servicing extreme ultraviolet imaging tool2025
Method for performing lithography process, light source, and EUV lithography sys2025
Apparatus and method for generating extreme ultraviolet radiation2025
Extreme ultraviolet mask and method of manufacturing the same2024
Extreme ultraviolet lithography method, extreme ultraviolet mask and formation m2024
Substrate support apparatus and method2024
Method of reducing undesired light influence in extreme ultraviolet exposure2024
Methods and systems for aligning master oscillator power amplifier systems2024
Method of fabricating reticle2024
Radiation source for lithography process2023
Apparatus and method for generating extreme ultraviolet radiation2023