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Home › Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films

Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films

US Patent 9534285 · Granted Jan 3, 2017

Estimated economic value: $7,312,000 ⓘ

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