Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound

US Patent 9523912 · Granted Dec 20, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Textile printing ink set and textile printing method2025
Active-light-sensitive or radiation-sensitive resin composition, resist film, pa2025
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pat2025
Composition for forming underlayer film, resist pattern forming method, and manu2025
Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pat2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pat2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pat2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pat2024
Kit, composition for forming underlayer film for imprinting, laminate, and produ2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pat2024
Photosensitive resin composition, heterocyclic ring-containing polymer precursor2024
Photosensitive composition for EUV light, pattern forming method, and method for2023