Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of forming a gate mask for fabricating a structure of gate lines

Method of forming a gate mask for fabricating a structure of gate lines

US Patent 9514942 · Granted Dec 6, 2016

Estimated economic value: $17,587,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lidar system including light emitter for multiple receiving units2024
Wavelength adaptive narrow band optical filter for a LIDAR system2024
Method of making and using a reusable mold for fabrication of optical elements2023
High voltage extended drain MOSFET (EDMOS) devices in a high-k metal gate (HKMG)2023
Lidar system with crosstalk reduction comprising a power supply circuit layer st2023
Co-integrated high voltage (HV) and medium voltage (MV) field effect transistors2022
Semiconductor devices having silicon/germanium active regions with different ger2021
Semiconductor device with interconnect to source/drain2021
High-voltage transistor device with thick gate insulation layers2020
Semiconductor device with interconnect to source/drain2020
Deep fence isolation for logic cells2020
Dual-depth STI cavity extension and method of production thereof2020