Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure

Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure

US Patent 9500956 · Granted Nov 22, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Spring element and fire-resistant cover layer2024
Imaging optical arrangement to image an object illuminated by X-rays2024
Method to acquire a 3D image of a sample structure2024
Method and device for characterizing the surface shape of an optical element2024
Apparatus and method for characterizing a microlithographic mask2024
Detection system for X-ray inspection of an object2023
Methods and patterning devices and apparatuses for measuring focus performance o2023
Plasma compression driver2023
Wavefront optimization for tuning scanner based on performance matching2023
Delivery unit for dispensing adhesive2022
Imaging optical unit for EUV microlithography2022
Patterning process improvement involving optical aberration2022