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Home › Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors

Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors

US Patent 9218944 · Granted Dec 22, 2015

Estimated economic value: $10,069,000 ⓘ

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