Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and equipment for removing photoresist residue after dry etch

Method and equipment for removing photoresist residue after dry etch

US Patent 9048268 · Granted Jun 2, 2015

Estimated economic value: $3,038,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Waterproof and moisture-permeable composite material2025
Wafer processing method2025
Method of manufacturing a semiconductor device with a work-function layer having2025
Method of manufacturing a semiconductor device with a work-function layer having2025
Semiconductor device and method2024
Isolation regions including two layers and method forming same2024
Semiconductor device with a work function layer having a concentration of fluori2022
Semiconductor device with a work function layer having a concentration of fluori2022
Isolation regions including two layers and method forming same2021
Contact openings and methods forming same2021
Process chamber and wafer processing method2020
Semiconductor device and methods of manufacture2020