Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Patterning mask and method of formation of mask using step double patterning

Patterning mask and method of formation of mask using step double patterning

US Patent 8871407 · Granted Oct 28, 2014

Estimated economic value: $12,316,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for wafer alignment2025
Method for chuck compensation via wafer shape control2025
Wafer chuck designs and methods for retaining a processing liquid on a surface o2025
Wet-dry bilayer resist2025
Method to form narrow slot contacts2025
In-situ lithography pattern enhancement with localized stress treatment tuning u2025
Hybrid patterning-bonding semiconductor tool2025
3D multiple location compressing bonded arm for advanced integration2025
Wafer shape control for W2W bonding2025
Replacement buried power rail in backside power delivery2025
Self-aligned method for vertical recess for 3D device integration2025
Wet-dry bilayer resist dual tone exposure2025