| 10217706 |
Semiconductor constructions |
Vishal Sipani, Kyle Armstrong, Michael Dean Van Patten, David A. Kewley, Ming-Chuan Yang |
2019-02-26 |
$27,872,000 |
| 9780029 |
Semiconductor constructions having conductive lines which merge with one another |
Vishal Sipani, Kyle Armstrong, Michael Dean Van Patten, David A. Kewley, Ming-Chuan Yang |
2017-10-03 |
$8,798,000 |
| 9583381 |
Methods for forming semiconductor devices and semiconductor device structures |
Ranjan Khurana, Scott L. Light, Kevin J. Torek, Anton J. deVilliers |
2017-02-28 |
$18,955,000 |
| 9465287 |
Methods of forming patterns for semiconductor device structures |
Scott L. Light, Yuan He, Michael A. Many |
2016-10-11 |
$11,335,000 |
| 9358753 |
Substrates and methods of forming a pattern on a substrate |
Vishal Sipani, David A. Kewley, Kyle Armstrong, Michael Dean Van Patten |
2016-06-07 |
$8,315,000 |
| 9330914 |
Methods of forming line patterns in substrates |
Scott L. Light, Vishal Sipani |
2016-05-03 |
$6,091,000 |
| 9235134 |
Lens heating compensation in photolithography |
Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Anton J. deVilliers +3 more |
2016-01-12 |
$5,575,000 |
| 9213239 |
Methods of forming patterns for semiconductor device structures |
Scott L. Light, Yuan He, Michael A. Many |
2015-12-15 |
$10,866,000 |
| 9140977 |
Imaging devices, methods of forming same, and methods of forming semiconductor device structures |
Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Anton J. deVilliers +3 more |
2015-09-22 |
$10,853,000 |
| 9102121 |
Substrates and methods of forming a pattern on a substrate |
Vishal Sipani, David A. Kewley, Kyle Armstrong, Michael Dean Van Patten |
2015-08-11 |
$8,373,000 |
| 9048292 |
Patterning methods and methods of forming electrically conductive lines |
Vishal Sipani, Kyle Armstrong, Michael Dean Van Patten, David A. Kewley, Ming-Chuan Yang |
2015-06-02 |
$12,912,000 |
| 8969214 |
Methods of forming a pattern on a substrate |
Scott L. Light, Kyle Armstrong, Vishal Sipani |
2015-03-03 |
$13,945,000 |
| 8883372 |
Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns |
Scott L. Light, Dan B. Millward, Anton J. deVilliers, Yuan He, Lijing Gou +3 more |
2014-11-11 |
|
| 8871407 |
Patterning mask and method of formation of mask using step double patterning |
Anton J. deVilliers |
2014-10-28 |
$12,316,000 |
| 8845908 |
Reticles, and methods of mitigating asymmetric lens heating in photolithography |
Scott L. Light, Dan B. Millward, Yuan He, Kaveri Jain, Lijing Gou +3 more |
2014-09-30 |
$13,656,000 |
| 8815497 |
Semiconductor constructions and methods of forming patterns |
Dan B. Millward, Kaveri Jain, Zishu Zhang, Lijing Gou, Anton J. deVillers +3 more |
2014-08-26 |
$14,612,000 |
| 8728721 |
Methods of processing substrates |
Scott L. Light, Kaveri Jain, Zishu Zhang, Anton J. deVilliers, Dan B. Millward +1 more |
2014-05-20 |
$6,537,000 |
| 8685630 |
Methods of forming a pattern in a material and methods of forming openings in a material to be patterned |
Anton J. deVilliers |
2014-04-01 |
$8,870,000 |
| 8625078 |
Illumination design for lens heating mitigation |
Jianming Zhou, Scott L. Light, Dan B. Millward, Yuan He, Kaveri Jain +3 more |
2014-01-07 |
|
| 8512938 |
Methods of forming a pattern in a material and methods of forming openings in a material to be patterned |
Anton J. deVilliers |
2013-08-20 |
$4,653,000 |
| 8507191 |
Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same |
Dan B. Millward, Yuan He, Lijing Gou, Zishu Zhang, Anton J. deVilliers +3 more |
2013-08-13 |
$4,189,000 |
| 8486611 |
Semiconductor constructions and methods of forming patterns |
Dan B. Millward, Kaveri Jain, Zishu Zhang, Lijing Gou, Anton J. De Villiers +3 more |
2013-07-16 |
$5,416,000 |
| 8440371 |
Imaging devices, methods of forming same, and methods of forming semiconductor device structures |
Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Anton J. deVilliers +3 more |
2013-05-14 |
$3,687,000 |
| 8153522 |
Patterning mask and method of formation of mask using step double patterning |
Anton J. deVilliers |
2012-04-10 |
$5,468,000 |
