Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › FinFET device fabrication using thermal implantation

FinFET device fabrication using thermal implantation

US Patent 8722431 · Granted May 13, 2014

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Horizontal GAA nano-wire and nano-slab transistors2025
Forming a doped hardmask2025
Gate all around device with fully-depleted silicon-on-insulator2025
Formation of gate all around device2025
Methods, mediums, and systems for identifying tunable domains for ion beam shape2025
Integrated flowable low-k gap-fill and plasma treatment2025
Void-free contact trench fill in gate-all-around FET architecture2025
Doping techniques2025
Method and apparatus for controlled ion implantation2025
Treatments to improve device performance2025
Conformal oxidation for gate all around nanosheet I/O device2025
Three dimensional device formation using early removal of sacrificial heterostru2025