Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Multi-step deposition control

Multi-step deposition control

US Patent 8163571 · Granted Apr 24, 2012

Estimated economic value: $12,212,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method including a formation of a diffusion barrier and semiconductor structure 2018
Vertical cavity surface emitting laser2018
Methods of forming metal nitride materials2015
Methods for fabricating integrated circuits including barrier layers for interco2015
Method including an etching of a portion of an interlayer dielectric in a semico2015
Method for detecting defects in a diffusion barrier layer2015
Multi-step deposition control2013
Multi-step deposition control2013
Multi-step deposition control2013
Test system and method of reducing damage in seed layers in metallization system2012
Method of testing an integrity of a material layer in a semiconductor structure2011
Reduced wafer warpage in semiconductors by stress engineering in the metallizati2011