Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method of sensing and removing residual charge from a processed wafer

System and method of sensing and removing residual charge from a processed wafer

US Patent 8111499 · Granted Feb 7, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Coaxial filter and communication radio frequency device2025
Temperature control apparatus for semiconductor processing equipment, and temper2025
Control method for multi-zone active-matrix temperature control in plasma proces2025
Plasma treatment apparatus, lower electrode assembly and forming method thereof2025
Plasma treatment apparatus, lower electrode assembly and forming method thereof2025
Hybrid heat sink2024
Multi-zone temperature control plasma reactor2024
Plasma reactor having a variable coupling of low frequency RF power to an annula2024
Resonator filter2024
LED straight tube lamp with an end face switch for a tone adjustment and a power2023
Radio frequency power supply system, plasma processor, and frequency-tuning matc2023
Liner assembly for vacuum treatment apparatus, and vacuum treatment apparatus2023