Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma reactor having a variable coupling of low frequency RF power to an annular electrode

Plasma reactor having a variable coupling of low frequency RF power to an annular electrode

US Patent 12062524 · Granted Aug 13, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Temperature control apparatus for semiconductor processing equipment, and temper2025
Temperature control apparatus for semiconductor processing equipment, and temper2025
Liquid dressing for promoting wound healing2025
Control method for multi-zone active-matrix temperature control in plasma proces2025
Plasma treatment apparatus, lower electrode assembly and forming method thereof2025
Multi-zone temperature control plasma reactor2024
Nursing bed with side rails movable between stowed and deployed positions2024
Ready to assemble structural system for a bed2024
Plasma reactor having a function of tuning low frequency RF power distribution2023
Zero gap foldable powered bed2023
Radio frequency power supply system, plasma processor, and frequency-tuning matc2023
Liner assembly for vacuum treatment apparatus, and vacuum treatment apparatus2023