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Home › Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside

Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside

US Patent 8017029 · Granted Sep 13, 2011

Estimated economic value: $7,377,000 ⓘ

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