Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby

Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby

US Patent 7835017 · Granted Nov 16, 2010

Estimated economic value: $3,637,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer alignment using form birefringence of targets or product2024
Apparatus and method for determining a condition associated with a pellicle2024
Alignment mark for two-dimensional alignment in an alignment system2021
Apparatus with a sensor and a method of performing target measurement2021
Lithographic apparatus and device manufacturing method2020
Radiation source having debris control2020
Method of determining an optimal focus height for a metrology apparatus2020
Method of optimizing the position and/or size of a measurement illumination spot2019
Substrate placement in immersion lithography2019
Lithographic apparatus and a method of manufacturing a lithographic apparatus2019
Lithographic apparatus2019
Lithographic apparatus and device manufacturing method2019