Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Graded spin-on organic antireflective coating for photolithography

Graded spin-on organic antireflective coating for photolithography

US Patent 7816069 · Granted Oct 19, 2010

Estimated economic value: $3,706,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Selective gas etching for self-aligned pattern transfer2025
Expert-in-the-loop AI for materials generation2025
Administration of benzodiazepine compositions2025
Administration of benzodiazepine compositions2025
Alternating hardmasks for tight-pitch line formation2025
Administration of benzodiazepine compositions2025
Chemical amplification methods and techniques for developable bottom anti-reflec2024
Expert-in-the-loop AI for materials discovery2024
Generating metal-oxide film2024
Self aligned pattern formation post spacer etchback in tight pitch configuration2024
Litho-litho-etch (LLE) multi color resist2024
Polymer brush adhesion promoter with UV cleavable linker2024