Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sequential deposition/anneal film densification method

Sequential deposition/anneal film densification method

US Patent 7790633 · Granted Sep 7, 2010

Estimated economic value: $11,945,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Smooth titanium nitride layers and methods of forming the same2025
Conformal titanium silicon nitride-based thin films and methods of forming same2025
Conformal titanium silicon nitride-based thin films and methods of forming same2025
Conformal and smooth titanium nitride layers and methods of forming the same2025
Conformal and smooth titanium nitride layers and methods of forming the same2025
Conformal and smooth titanium nitride layers and methods of forming the same2025
Gapfill of variable aspect ratio features with a composite PEALD and PECVD metho2025
Conformal titanium nitride-based thin films and methods of forming same2024
Selective processing with etch residue-based inhibitors2024
Selective processing with etch residue-based inhibitors2023
Smooth titanium nitride layers and methods of forming the same2023
Conformal and smooth titanium nitride layers and methods of forming the same2022