Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode

Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode

US Patent 7733095 · Granted Jun 8, 2010

Estimated economic value: $8,435,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Rating substrate support assemblies based on impedance circuit electron flow usi2025
Symmetric plasma source to generate pie-shaped treatment2024
Metal oxide preclean chamber with improved selectivity and flow conductance2024
Smart dynamic load simulator for RF power delivery control system2024
Cleaning of SIN with CCP plasma or RPS clean2024
High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) 2024
Methods and apparatus for reducing sputtering of a grounded shield in a process 2024
Cleaning of sin with CCP plasma or RPS clean2024
Methods and apparatus for processing a substrate2024
Methods and systems to modulate film stress2024
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-2023
Shaped electrodes for improved plasma exposure from vertical plasma source2022