Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods for low temperature oxidation of a semiconductor device

Methods for low temperature oxidation of a semiconductor device

US Patent 7645709 · Granted Jan 12, 2010

Estimated economic value: $28,444,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Nanocrystalline diamond with amorphous interfacial layer2025
Low temperature selective etching of silicon nitride using microwave plasma2025
Symmetric and irregular shaped plasmas using modular microwave sources2025
Isotropic silicon nitride removal2025
Method and apparatus of low temperature plasma enhanced chemical vapor depositio2025
Substrate support with multiple embedded electrodes2025
Monolithic modular microwave source with integrated process gas distribution2025
Monolithic modular microwave source with integrated temperature control2024
Modular high-frequency source2024
Method of forming silicon nitride films using microwave plasma2024
Monolithic modular microwave source with integrated process gas distribution2024
Modular microwave source with local lorentz force2023