Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › ALD metal oxide deposition process using direct oxidation

ALD metal oxide deposition process using direct oxidation

US Patent 7569501 · Granted Aug 4, 2009

Estimated economic value: $13,023,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Eco-efficiency monitoring and exploration platform for semiconductor manufacturi2025
Engineered substrates for use in crystalline-nitride based devices2017
Method for forming a doped metal oxide for use in resistive switching memory ele2017
Embedded nonvolatile memory elements having resistive switching characteristics2016
Tensile separation of a semiconducting stack2016
Dielectric extension to mitigate short channel effects2016
Confined defect profiling within resistive random memory access cells2016
Atomic layer deposition of metal oxides for memory applications2016
Offset cancellation with minimum noise impact and gain-bandwidth degradation2015
Embedded nonvolatile memory elements having resistive switching characteristics2015
Atomic layer deposition of metal oxide materials for memory applications2015
Transition metal oxide bilayers2015