Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Silicon based optically degraded arc for lithographic patterning

Silicon based optically degraded arc for lithographic patterning

US Patent 7507521 · Granted Mar 24, 2009

Estimated economic value: $27,396,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System in package with interconnected modules2023
Active package substrate having anisotropic conductive layer2023
Integrated structures containing vertically-stacked memory cells2022
High density die package configuration on system boards2021
Building stacked hollow channels for a three dimensional circuit device2021
Integrated structures containing vertically-stacked memory cells2021
Active package substrate having anisotropic conductive layer2020
Hybrid die stacking2019
Exposure activated chemically amplified directed self-assembly (DSA) for back en2019
Integrated structures containing vertically-stacked memory cells2019
Integrated structures containing vertically-stacked memory cells2017
Exposure activated chemically amplified directed self-assembly (DSA) for back en2017