{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography", "item": "https://www.patentleaderboard.com/patent/7504185"}]}
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Home › Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography

Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography

US Patent 7504185 · Granted Mar 17, 2009

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