Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for a maskless lithography rasterization technique based on global optimization

Method and system for a maskless lithography rasterization technique based on global optimization

US Patent 7469058 · Granted Dec 23, 2008

Estimated economic value: $2,932,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system for calculating printed area metric indicative of stochastic v2022
Method and system for calculating probability of success or failure for a lithog2021
Shrink process aware assist features2018
Methods for fabricating integrated circuits using directed self-assembly includi2016
Methods for fabricating integrated circuits using directed self-assembly includi2016
Methods for fabricating integrated circuits using designs of integrated circuits2016
Methods for fabricating integrated circuits including generating photomasks for 2016
Methods for fabricating integrated circuits including generating photomasks for 2015
Methods for fabricating integrated circuits including generating photomasks for 2015
Methods for fabricating integrated circuits including topographical features for2015
Methods for fabricating integrated circuits including generating e-beam patterns2015
Methods for fabricating integrated circuits including generating photomasks for 2015