Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pad conditioning head for CMP process

Pad conditioning head for CMP process

US Patent 7459056 · Granted Dec 2, 2008

Estimated economic value: $11,257,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

In-situ wafer rotation for carousel processing chambers2023
Pedestal support design for precise chamber matching and process control2022
Device to increase deposition uniformity in spatial ALD processing chamber2021
Temporal atomic layer deposition process chamber2021
High temperature heater for processing chamber2021
Apparatus for prevention of backside deposition in a spatial ALD process chamber2020
Device to increase deposition uniformity in spatial ALD processing chamber2019
Non-metallic thermal CVD/ALD Gas Injector and Purge Systems2019
Load lock chamber designs for high-throughput processing system2015
Temperature actuated tensioning mechanism2014
Method and apparatus for sputtering onto large flat panels2013
Coils for generating a plasma and for sputtering2013