Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils

Uniform magnetically enhanced reactive ion etching using nested electromagnetic coils

US Patent 7458335 · Granted Dec 2, 2008

Estimated economic value: $11,257,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Stacking and dispensing module2018
Method and system for wafer level singulation2016
Method for a banknote detector device, and a banknote detector device2015
Method and system for wafer level singulation2013
Patterning 3D features in a substrate2011
Methods and apparatus for transferring conductive pieces during semiconductor de2008
Integrated low k dielectrics and etch stops2007
Optical ready substrates2006
Ashable layers for reducing critical dimensions of integrated circuit features2006
Optical ready substrates2006
Optical ready wafers2006
System level in-situ integrated dielectric etch process particularly useful for 2005