Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool

System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool

US Patent 7102733 · Granted Sep 5, 2006

Estimated economic value: $5,502,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optimization using a non-uniform illumination intensity profile2025
Lithographic apparatus and electrostatic clamp designs2024
Alert rule system and method for updating alert rules2024
Method to manufacture nano ridges in hard ceramic coatings2024
Pulsed charged-particle beam system2024
Data derived user behavior modeling2023
Method and apparatus for angular-resolved spectroscopic lithography characteriza2022
Method and system for calculating printed area metric indicative of stochastic v2022
Alignment sensor apparatus for process sensitivity compensation2021
Method and system for calculating probability of success or failure for a lithog2021
Substrates and methods of using those substrates2021
Method and apparatus for angular-resolved spectroscopic lithography characteriza2021