Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Relax gas discharge laser lithography light source

Relax gas discharge laser lithography light source

US Patent 7088758 · Granted Aug 8, 2006

Estimated economic value: $7,262,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Nozzle apparatus2025
Guiding device and associated system2025
Oncolytic adenovirus with enhanced replication properties comprising modificatio2025
Laser system for source material conditioning in an EUV light source2025
Exogenous gene expression in recombinant adenovirus for minimal impact on viral 2025
EUV light source target metrology2025
Robust fluid coupling apparatus2025
System for monitoring a plasma2024
Laser system for target metrology and alteration in an EUV light source2024
Prolonging optical element lifetime in an EUV lithography system2023
Guiding device and associated system2023
Determining moving properties of a target in an extreme ultraviolet light source2023