Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of manufacturing low dielectric film by a vacuum ultraviolet chemical vapor deposition

Method of manufacturing low dielectric film by a vacuum ultraviolet chemical vapor deposition

US Patent 7026257 · Granted Apr 11, 2006

Estimated economic value: $1,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Compound semiconductor device and method of manufacturing compound semiconductor2025
Flexible polyamide2024
Information processing device and information processing system2024
Semiconductor manufacturing device and method of polishing semiconductor substra2024
Method for designing RNA-binding protein utilizing PPR motif, and use thereof2023
Metal-resin bonded member and method of manufacturing the same2023
Fusion protein for improving protein expression from target mRNA2021
Method for forming multilayer coating film2021
Method for designing RNA-binding protein utilizing PPR motif, and use thereof2021
Semiconductor manufacturing device and method of polishing semiconductor substra2021
Method for designing RNA binding protein utilizing PPR motif, and use thereof2020
Semiconductor device, method of manufacturing semiconductor device, and antenna 2020