Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Sequential sputter and reactive precleans of vias and contacts

Sequential sputter and reactive precleans of vias and contacts

US Patent 7014887 · Granted Mar 21, 2006

Estimated economic value: $22,141,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

High-speed filling and plugging system and filling and plugging method thereof2025
Oil-water separation device2025
Magnetic thin film laminated structure and micro-inductive device thereof2025
Deposition of silicon-based dielectric films2025
Portable power station2023
Magnetic thin film laminated structure deposition method2023
Portable power station2022
Degassing chamber and semiconductor processing apparatus2022
Semiconductor manufacturing process2021
Plasma processing apparatus2021
Annealing method, process chamber and annealing apparatus2021
Magnetic thin film deposition chamber and thin film deposition apparatus2020