Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for forming TTO nitride liner for improved collar protection and TTO reliability

Method for forming TTO nitride liner for improved collar protection and TTO reliability

US Patent 6897107 · Granted May 24, 2005

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Conductive contacts in semiconductor on insulator substrate2021
Conductive contacts in semiconductor on insulator substrate2020
Conductive contacts in semiconductor on insulator substrate2017
Fin isolation structures facilitating different fin isolation schemes2017
Selective local metal cap layer formation for improved electromigration behavior2016
Semiconductor devices having tensile and/or compressive stress and methods of ma2016
Selective local metal cap layer formation for improved electromigration behavior2016
Selective local metal cap layer formation for improved electromigration behavior2016
Semiconductor devices having tensile and/or compressive stress and methods of ma2016
Deep trench MIM capacitor and moat isolation with epitaxial semiconductor wafer 2015
Measuring metal line spacing in semiconductor devices2015
Selective local metal cap layer formation for improved electromigration behavior2015