Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma induced depletion of fluorine from surfaces of fluorinated low-k dielectric materials

Plasma induced depletion of fluorine from surfaces of fluorinated low-k dielectric materials

US Patent 6846737 · Granted Jan 25, 2005

Estimated economic value: $26,797,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Metallic sealants in transistor arrangements2022
Contact stacks to reduce hydrogen in thin film transistor2022
Chamber with individually controllable plasma generation regions for a reactor f2021
Plasma processing reactor with a magnetic electron-blocking filter external of t2020
Real-time measurement of a surface charge profile of an electrostatic chuck2020
Method of real time in-situ chamber condition monitoring using sensors and RF co2019
Wafer-level-packaged BAW devices with surface mount connection structures2019
Multiple electrode substrate support assembly and phase control system2018
Method of real time in-situ chamber condition monitoring using sensors and RF co2018
Stealth-dicing compatible devices and methods to prevent acoustic backside refle2018
Formation of dielectric with smooth surface2018
Method and apparatus for controlling plasma near the edge of a substrate2018