Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma focus light source with improved pulse power system

Plasma focus light source with improved pulse power system

US Patent 6815700 · Granted Nov 9, 2004

Estimated economic value: $9,542,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Guiding device and associated system2025
Oncolytic adenovirus with enhanced replication properties comprising modificatio2025
Laser system for source material conditioning in an EUV light source2025
Oxygen-loss resistant top coating for optical elements2025
Exogenous gene expression in recombinant adenovirus for minimal impact on viral 2025
System for monitoring a plasma2024
Laser system for target metrology and alteration in an EUV light source2024
Prolonging optical element lifetime in an EUV lithography system2023
Guiding device and associated system2023
Exogenous gene expression in recombinant adenovirus for minimal impact on viral 2022
Prolonging optical element lifetime in an EUV lithography system2022
System for monitoring a plasma2022