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Home › Method of enhancing gate patterning properties with reflective hard mask

Method of enhancing gate patterning properties with reflective hard mask

US Patent 6753266 · Granted Jun 22, 2004

Estimated economic value: $4,162,000 ⓘ

Assignee

AMD

Inventors

Todd P. Lukanc (72 patents)
Scott A. Bell (105 patents)
Christopher F. Lyons (147 patents)
Marina V. Plat (68 patents)
Ramkumar Subramanian (251 patents)

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