Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of photolithographic exposure dose control as a function of resist sensitivity

Method of photolithographic exposure dose control as a function of resist sensitivity

US Patent 6674516 · Granted Jan 6, 2004

Estimated economic value: $7,683,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Insulated panels and methods of enhancing thermal insulation of structures using2025
Method of fine-tuning process controls during integrated circuit chip manufactur2017
Self-aligned emitter-base bipolar junction transistor with reduced base resistan2017
Method of fine-tuning process controls during integrated circuit chip manufactur2016
MEMS process method for high aspect ratio structures2012
Overlay and CD process window structure2009
HDP-based ILD capping layer2008
HDP-based ILD capping layer2006
Multi-run selective pattern and etch wafer process2006
Overlay and CD process window structure2005
Method for detection of photolithographic defocus2005
System and method for optimizing metrology sampling in APC applications2005