Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High-frequency electrostatically shielded toroidal plasma and radical source

High-frequency electrostatically shielded toroidal plasma and radical source

US Patent 6634313 · Granted Oct 21, 2003

Estimated economic value: $27,123,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Auxiliary plasma source for robust ignition and restrikes in a plasma chamber2025
Plasma chamber with multiphase rotating independent gas cross-flow with reduced 2025
Pulsed voltage source for plasma processing applications2025
Substrate support gap pumping to prevent glow discharge and light-up2025
Methods and apparatus for processing a substrate2025
Advanced temperature control for wafer carrier in plasma processing chamber2025
Solid-state switch based high-speed pulser with plasma IEDF modification capabil2025
Continuous liner for use in a processing chamber2024
Methods and apparatus for toroidal plasma generation2024
In-situ electric field detection method and apparatus2024
Pulsed voltage source for plasma processing applications2024
Symmetric VHF source for a plasma reactor2024