{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Reducing resist residue defects in open area on patterned wafer using trim mask", "item": "https://www.patentleaderboard.com/patent/6613500"}]}

Home › Reducing resist residue defects in open area on patterned wafer using trim mask

Reducing resist residue defects in open area on patterned wafer using trim mask

US Patent 6613500 · Granted Sep 2, 2003

Estimated economic value: $4,831,000 ⓘ

Assignee

AMD

Inventors

Khoi A. Phan (101 patents)
Bhanwar Singh (259 patents)
Ramkumar Subramanian (251 patents)
Michael K. Templeton (96 patents)
Jeff P. Erhardt (17 patents)

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