Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Correcting the system polarization sensitivity of a metrology tool having a rotatable polarizer

Correcting the system polarization sensitivity of a metrology tool having a rotatable polarizer

US Patent 6522406 · Granted Feb 18, 2003

Estimated economic value: $757,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer dicing using femtosecond-based laser and plasma etch2024
Wafer dicing using femtosecond-based laser and plasma etch2023
Loosely-coupled inspection and metrology system for high-volume production proce2023
Variable aperture mask2022
Proximity contact cover ring for plasma dicing2021
Wafer dicing using femtosecond-based laser and plasma etch2021
Wafer dicing using femtosecond-based laser and plasma etch2020
Transfer arm for film frame substrate handling during plasma singulation of wafe2020
Variable aperture mask2020
Wafer dicing using femtosecond-based laser and plasma etch2020
Methods and apparatus for substrate edge cleaning2019
Wafer dicing using femtosecond-based laser and plasma etch2018