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Home › Method for enhancing selectivity between a film of a light-sensitive material and a layer to be etched in electronic semiconductor device fabrication processes

Method for enhancing selectivity between a film of a light-sensitive material and a layer to be etched in electronic semiconductor device fabrication processes

US Patent 6495455 · Granted Dec 17, 2002

Estimated economic value: $23,784,000 ⓘ

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