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Home › Method of enhancing the rate of removal of a layer of light-sensitive material after an etching step in the fabrication of semiconductor electronic devices

Method of enhancing the rate of removal of a layer of light-sensitive material after an etching step in the fabrication of semiconductor electronic devices

US Patent 6313041 · Granted Nov 6, 2001

Estimated economic value: $47,399,000 ⓘ

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