Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Discharge unit for a high repetition rate excimer or molecular fluorine laser

Discharge unit for a high repetition rate excimer or molecular fluorine laser

US Patent 6466599 · Granted Oct 15, 2002

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Excimer laser with uniform beam2021
Energy controller for excimer-laser silicon crystallization2019
Lasing-gas mixture for excimer laser2018
Capacitor assembly2017
Radiation source2017
Lithographic apparatus, EUV radiation generation apparatus and device manufactur2015
Source collector, lithographic apparatus and device manufacturing method2015
EUV radiation generation apparatus2013
Radiation system and lithographic apparatus2013
Electrodes for generating a stable discharge in gas laser systems2012
Gas laser electrodes shaped in the longitudinal axis2010
Gas laser electrodes shaped in the longitudinal axis2010