Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process for fabricating an ONO structure having a silicon-rich silicon nitride layer

Process for fabricating an ONO structure having a silicon-rich silicon nitride layer

US Patent 6406960 · Granted Jun 18, 2002

Estimated economic value: $3,499,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optimization engine for energy sustainability2024
Optimization of physical cell placement for integrated circuits2023
Method and system for optimizing an item assortment2022
Optimization engine for energy sustainability2022
And optimization of physical cell placement2021
Integrated circuit design systems and methods2019
Apparatus and methods for supporting workpieces during plasma processing2018
Integrated circuit design systems and methods2018
Prefabricated lightweight steel wall tensioning system2017
Programmable latency count to achieve higher memory bandwidth2016
Apparatus and method for intraluminal polymer deposition2016
Apparatus and methods for handling workpieces of different sizes2016